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MCS100
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Multi-component process photometer for gase and liquids Process control in corrosive and toxic gases or liquids. The MCS100 is equipped with a very robust singlebeam process photometer for performing process measurements in the UV, VIS, (N)IR spectral range. Up to 8 components can be measured continuously with one MCS100. It is also possible to offset disturbance variables. Cells ranging from the 0.1 mm high-pressure liquid cell to the compact 6 m high-temperature long-path cell are available.
Applications Process control of gases and liquids with problematic components; high pressure; high temperature; suitable for use in explosive atmospheres (option)
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| Technical specification |
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Measuring components |
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UV/VIS/(N)IR absorbing gases and liquids, e.g. Cl2, SO2, CO2, NH3, H2O, C2H4, C2H4Cl2, COCl2, NCO, C2H4, CH3SH, H2S, HCl ... |
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Number of components |
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max. 8 |
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Measuring range |
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ppm to vol% dep. on application, 2 ranges |
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Measurement principle |
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Photometer, dual wavelength and gas filter correl. |
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Ambient temperature |
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0 ... +40 °C |
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Protection category |
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IP 65, special designs upon request |
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Number of sample points |
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max. 8 |
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Measured value output |
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24 * 0/4 ... 20 mA, 64 relays |
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Interfaces |
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RS232 (V 24) |
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Status / control signals |
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via digital inputs and outputs |
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Test function |
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Zero and span control automatically |
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Remarks |
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Very robust single-beam photometer for process analysis in UV/VIS/(N)IR spectral range. The correction of interferences is possible. Cells from 0.1 mm high pressure liquid cell to the compact 6 m high temperature long path cell are available. |
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